Un abonnement à JoVE est nécessaire pour voir ce contenu. Connectez-vous ou commencez votre essai gratuit.
Chapitres
- 00:05Titre
- 01:20Cleaning the Germanium Substrate
- 02:46Loading to the Vacuum System and Germanium Deoxidization
- 04:30Thin Film ALD Growth and Annealing of the Strontium Titanate (STO) Film
- 07:23Results: RHEED and X-ray Diffraction Analysis
- 08:41Conclusion
This work details the procedures for the growth and characterization of crystalline SrTiO3 directly on germanium substrates by atomic layer deposition. The procedure illustrates the ability of an all-chemical growth method to integrate oxides monolithically onto semiconductors for metal-oxide semiconductor devices.
