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电介质元表面的等强度光束生成演示

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Ingénierie

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Journal JoVE Ingénierie

Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces

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电介质元表面的等强度光束生成演示

DOI:

10.3791/59066-v

•

09:33 min

•

June 07, 2019

•

Gwanho Yoon, Dasol Lee, Junsuk Rho^2,3

¹Department of Mechanical Engineering,Pohang University of Science and Technology (POSTECH), ²Department of Chemical Engineering,Pohang University of Science and Technology (POSTECH), ³National Institute of Nanomaterials Technology (NINT)

Chapitres

00:04Titre
00:52Deposition of Hydrogenated Amorphous Silicon (a-Si:H) on a Fused Silica Substrate by Plasma-enhanced Chemical Vapor Deposition (PECVD)
01:35Formation of the Chromium Etching Mask
06:53Etching Process of Hydrogenated Amorphous Silicon
07:41Results: The Fabricated Metasurface and its Polarization-independent
08:31Conclusion

Summary

Traduction automatique

提出了介电元表面的制造和光学表征方案。该方法不仅可用于光束分割器的制造,还可用于一般介电元表面的制造,如透镜、全息图和光学斗篷。

Tags

Metasurface Fabrication Dielectric Metasurface Equal-intensity Beam Generation PECVD PMMA Electron Beam Lithography Silicon Photonics

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