Portland State University View Institution's Website 2 articles published in JoVE Engineering Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography Shankar B. Rananavare1, Moshood K. Morakinyo2 1Department of Chemistry, Portland State University, 2Logic Technology Department, Intel Corporation Uniformly sized nanoparticles can remove fluctuations in contact hole dimensions patterned in poly(methyl methacrylate) (PMMA) photoresist films by electron beam (E-beam) lithography. The process involves electrostatic funneling to center and deposit nanoparticles in contact holes, followed by photoresist reflow and plasma- and wet-etching steps. Biology Visualization of UV-induced Replication Intermediates in E. coli using Two-dimensional Agarose-gel Analysis H. Arthur Jeiranian*1, Brandy J. Schalow*1, Justin Courcelle1 1Department of Biology, Portland State University We present a procedure by which two-dimensional agarose-gel analysis can be used to identify the structure of replication intermediates that occur following UV irradiation.