Integration af Light fældefangst Sølv Nanostrukturer i hydrogeneret Mikrokrystallinsk silicium solceller ved Transfer Printing
Summary
A viable transfer printing-based methodology to introduce plasmonic metal nanostructures in solar cells is described. Using nanopillar poly(dimethylsiloxane) stamps, an Ag-based ordered nanodisk array was integrated with standard hydrogenated microcrystalline Si solar cells, which led to improved device performances due to plasmonic light trapping.
Abstract
One of the potential applications of metal nanostructures is light trapping in solar cells, where unique optical properties of nanosized metals, commonly known as plasmonic effects, play an important role. Research in this field has, however, been impeded owing to the difficulty of fabricating devices containing the desired functional metal nanostructures. In order to provide a viable strategy to this issue, we herein show a transfer printing-based approach that allows the quick and low-cost integration of designed metal nanostructures with a variety of device architectures, including solar cells. Nanopillar poly(dimethylsiloxane) (PDMS) stamps were fabricated from a commercially available nanohole plastic film as a master mold. On this nanopatterned PDMS stamps, Ag films were deposited, which were then transfer-printed onto block copolymer (binding layer)-coated hydrogenated microcrystalline Si (µc-Si:H) surface to afford ordered Ag nanodisk structures. It was confirmed that the resulting Ag nanodisk-incorporated µc-Si:H solar cells show higher performances compared to a cell without the transfer-printed Ag nanodisks, thanks to plasmonic light trapping effect derived from the Ag nanodisks. Because of the simplicity and versatility, further device application would also be feasible thorough this approach.
Introduction
Der har været et mangeårigt krav om anvendelse af funktionelle nanostrukturer i en bred vifte af teknologiske område. En af forventningerne til denne tendens er at åbne nye design af enhedens arkitekturer, der fører til forbedrede eller nyskabende forestillinger. På området for solceller, for eksempel anvendelse af metal nanostrukturer har været aktivt undersøgt på grund af deres spændende optiske (dvs. plasmoniske) egenskaber, 1 potentielt gavnlig til at konstruere effektive lys fældefangst systemer. 2,3 Faktisk er nogle teoretiske studier 4 -6 har foreslået, at sådanne plasmoniske lys fældefangst kunne opnå effekter overstiger de konventionelle ray optik (texturering) -baseret lys fældefangst grænse. 7 Som et resultat, udvikle strategier til at integrere de ønskede metal nanostrukturer med solceller er blevet stadig vigtigere for at realisere disse teoretiske forudsigelser.
En række strategier harblevet foreslået for at imødekomme denne udfordring. 8-24 Disse omfatter for eksempel, enkel (billig) termisk udglødning af metal-film 8,9 eller dispersion af præ-syntetiseret metal nanopartikler, 10,11 som begge resulterede i vellykkede demonstrationer af plasmoniske lys trapping. Dog skal det påpeges, at metal nanostrukturer fremstillet ved disse fremgangsmåder normalt er udfordrende at matche de teoretiske modeller. I modsætning hertil traditionelle nano-fabrikationsteknikker i halvlederindustrien, såsom fotolitografi og elektronstrålelitografi, 12,13 kan styre strukturer godt stykke under den sub-100 nm plan, men de er ofte for dyre og tidskrævende at gælde for solceller, hvor stort areal kapacitet med lave omkostninger er afgørende. For at opfylde de lave omkostninger, højt gennemløb, og store arealkrav med nanoskala styrbarhed, metoder såsom nanoimprint litografi, 14-16 blød litografi, 17,18 </sup> Nanosfære litografi, 19-21 og hole-maske kolloid litografi 22-24 ville være lovende. Blandt disse valg, har vi udviklet en blød litografisk, avanceret overførsel trykning teknik. 25 Brug en nanostruktureret poly (dimethylsiloxan) (PDMS) frimærker og blokcopolymer-baserede klæbende lag, kunne mønster af bestilte metal nanostrukturer let opnås på en række teknologisk relevante materialer, herunder dem for solceller.
Fokus i denne artikel er at beskrive den detaljerede procedure for vores overførsel trykning tilgang til at indarbejde effektive lys fældefangst plasmoniske nanostrukturer i de eksisterende solcelle strukturer. Som demonstrative tilfælde Ag nanodisks og tyndfilm hydrogeneret mikrokrystallinsk Si (pC-Si: H) solceller blev udvalgt i denne undersøgelse (figur 1), 26, selv om andre typer af metaller og solceller er forenelige med denne fremgangsmåde. Sammen med sin procesenkelhed, ville tilgangen være af interesse for forskellige forskere som et praktisk værktøj til at integrere funktionelle metal nanostrukturer med enheder.
Protocol
Representative Results
Discussion
I denne artikel, var en dobbelt-lag hårdt / bløde PDMS komposit ansat som stempel materialer. 27 Denne kombination viste sig at være afgørende for præcist replikere den forælder nanostruktur i formen, som var en hexagonalt tætpakket rundt hul matrix, hvis diameter 230 nm, dybde på 500 nm, og hullet center-til-center på 460 nm. Når kun bløde PDMS blev anvendt, stempel altid resulterede i et dårligt nanostrukturerede overflade (for eksempel ingen skarpe kant i den omvendte søjlestrukturen) på grun…
Divulgazioni
The authors have nothing to disclose.
Acknowledgements
The authors thank New Energy and Industrial Technology Development Organization (NEDO) under Ministry of Economy, Trade, and Industry (METI), Japan, for the financial support.
Materials
| Nanohole mold | Scivax http://www.scivax.com |
FLH230/500-120 | |
| PTFE container | Eishin http://www.colbyeishin.com |
n/a | Custom made |
| Hard-PDMS materials | Gelest http://www.gelest.com/gelest/forms/Home/home.aspx |
VDT-731 | Vinylmethylsiloxane-dimethylsiloxane copolymer |
| SIP6831.1 | Pt-divinyltetramethyldisiloxane complex | ||
| HMS-301 | Methylhydrosiloxane-dimethylsiloxane copolymer | ||
| 2,4,6,8-tetramethyltetra-vinylcyclotetrasiloxane | Sigma-Aldrich http://www.sigmaaldrich.com |
396281 | Additive for hard-PDMS |
| Soft-PDMS materials | Dow Corning http://www.dowcorning.com |
Sylgard-184 | Silicone precursor |
| PS-b-P2VP | Polymer Source http://polymersource.com |
P5742-S2VP | Mn × 103 = 133-b-132 |
| Glass/SnO2:F substrates | Asahi Glass Co. Ltd. http://www.agc.com/english/company |
Type VU | Chemical mechanical polished by D-process Inc. (http://d-process.jp/index.html) to flatten the surfaces |
| Detergent | Fruuchi Chemical Co. http://www.furuchi.co.jp/eng/main.htm |
Semico-clean 56 | Used for the cleaning of Glass/SnO2:F substrates |
| ZnO:Ga supputtering target | AGC Ceramics Co. Ltd. http://www.agcc.jp/2005/en/index.html |
5.7GZO | |
| Ag supputtering target | Mitsubishi Materials Co. http://www.mitsubishicarbide.com/mmc/en/index.html |
4NAg | |
| Double-sided adhesive tape | Nisshin EM Co. http://nisshin-em.co.jp/information/carbontape.html |
732 | |
| Polyimide tape | Dupont http://www.dupont.com/products-and-services/membranes-films/polyimide-films/brands/kapton-polyimide-film.html |
Kapton 650S#25 | |
| Sn-Zn-based Solder | Kuroda Techno Co., Ltd. http://www.kuroda-techno.com/english/index.html |
Cerasolzer AL-200 | |
| Digital micro pipette | Nichiryo http://www.nichiryo.co.jp/en/product/pipette/ex/index.html |
00-NPX2-20 00-NPX2-200 00-NPX2-1000 |
|
| Heating chamber | Tokyo Rikakikai Co., Ltd. http://www.eyelaworld.com/product_view.php?id=120 |
VOS-201SD | |
| Electron beam evaporator (two types) |
Canon-Anelva https://www.canon-anelva.co.jp/english/index.html |
n/a | Custom made |
| Arios http://arios.com/ |
n/a | Custom made | |
| Sputtering system | Ulvac http://www.ulvac.co.jp/en |
SBR-2306 | |
| PECVD system | Shimadzu Emit Co. Ltd. http://www.shimadzu.co.jp/emit/en/ |
SLCM-13 | |
| Ar plasma system | Diner Electric Gmbh http://www.plasma.de/index.html |
Femto | |
| RIE system | Samco Inc. http://www.samcointl.com |
RIE-10NR | |
| Ultrasonic soldering device | Colby-Eishin Enterprises, Inc. http://www.colbyeishin.com/sub_sunbonder.htm |
SUNBONDER | |
| EQE measurement system | Bunkoukeiki Co. Ltd. http://www.bunkoukeiki.co.jp/ |
CEP-25BXS | |
| J-V characteristics measurement system | OTENTOSUN-5S-I/V | ||
| Amorphous Si reference cell | WPVS-NPB-S1 | For light intensity calibration | |
| Digital multi-meter | Keithley Instruments Inc. http://www.keithley.com/ |
2400 |
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