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Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics
 

Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics

Article DOI: 10.3791/54235-v • 13:58 min • September 28th, 2016
September 28th, 2016 •
1, 2, 3, 1, 3
1Department of Physics and Institute of Nanoscience, National Chung Hsing University, 2Metallurgy Section, Materials & Electro-Optics Research Division, National Chung-Shan Institute of Science and Technology, 3National Center for High-Performance Computing

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This paper reports the nanomaterial fabrication of a fullerene Si substrate inspected and verified by nanomeasurements and molecular dynamic simulation.

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C84-embedded Si Substrate Scanning Probe Microscopy Molecular Dynamics Heterojunction Electronic Properties Optoelectronic Properties Mechanical Properties Magnetic Properties Field Emission Properties Nanostructures Skinny Probe Microscope Resolution Molecular Dynamic Simulation Indentation Process Parallel Computing Supercluster ALPS Nanoscience Lab Silicon 111 Substrate Cleaning Ultrahigh Vacuum System Oxide Layer Removal Impurity Removal C84 Deposition Castle Evaporator Out-gassing Of Impurities C84 Nanoparticles
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