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Fabrication of Micro-Patterned Chip with Controlled Thickness for High-Throughput Cryogenic Electron Microscopy
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1Department of Biomedical-Chemical Engineering,The Catholic University of Korea, 2Department of Biotechnology,The Catholic University of Korea, 3School of Chemical and Biological Engineering, and Institute of Chemical Processes,Seoul National University, 4Center for Nanoparticle Research,Institute of Basic Science (IBS), 5Institute of Engineering Research, College of Engineering,Seoul National University, 6Advanced Institutes of Convergence Technology,Seoul National University
Capitoli
- 00:04Introduction
- 00:55Pattern the Photoresist and Silicon Nitride‐Deposited Si Wafer (SixNy)
- 02:31Etching the Si and Eliminating the KOH Etching Residues
- 03:21Prepare the Micro‐Patterned SixNy and Eliminate the PR
- 04:25Transfer Graphene Oxide (GO) by the Drop‐Casting Method
- 05:30Results: Analysis of the Micro‐Patterned Chip with GO Windows
- 06:35Conclusion
