Integrering av Lys Overlappings sølv nanostrukturer i hydrogenert mikrokrystallinsk silisium solceller ved Transfer Printing
Summary
A viable transfer printing-based methodology to introduce plasmonic metal nanostructures in solar cells is described. Using nanopillar poly(dimethylsiloxane) stamps, an Ag-based ordered nanodisk array was integrated with standard hydrogenated microcrystalline Si solar cells, which led to improved device performances due to plasmonic light trapping.
Abstract
One of the potential applications of metal nanostructures is light trapping in solar cells, where unique optical properties of nanosized metals, commonly known as plasmonic effects, play an important role. Research in this field has, however, been impeded owing to the difficulty of fabricating devices containing the desired functional metal nanostructures. In order to provide a viable strategy to this issue, we herein show a transfer printing-based approach that allows the quick and low-cost integration of designed metal nanostructures with a variety of device architectures, including solar cells. Nanopillar poly(dimethylsiloxane) (PDMS) stamps were fabricated from a commercially available nanohole plastic film as a master mold. On this nanopatterned PDMS stamps, Ag films were deposited, which were then transfer-printed onto block copolymer (binding layer)-coated hydrogenated microcrystalline Si (µc-Si:H) surface to afford ordered Ag nanodisk structures. It was confirmed that the resulting Ag nanodisk-incorporated µc-Si:H solar cells show higher performances compared to a cell without the transfer-printed Ag nanodisks, thanks to plasmonic light trapping effect derived from the Ag nanodisks. Because of the simplicity and versatility, further device application would also be feasible thorough this approach.
Introduction
Det har vært en langvarig behov for anvendelse av funksjonelle nanostrukturer i et bredt spekter av teknologiske feltet. En av forventninger til denne trenden er å åpne nye utformingen av enhets arkitekturer som fører til bedre eller nyskapende forestillinger. I feltet av solceller, for eksempel bruk av metallnanostrukturer har vært aktivt utforsket på grunn av deres spennende optiske (dvs. Plasmonic) egenskaper, en potensielt gunstig å konstruere effektive lys fangstsystemer. 2,3 Faktisk noen teoretiske studier 4 -6 har antydet at en slik plasmonic lys fangst kunne oppnå effekter som overskrider de vanlige ray optikk (teksture) -baserte lys fangst grense. 7 Som et resultat, utvikle strategier for å integrere ønskede metall nanostrukturer med solceller har blitt stadig viktigere for å realisere disse teoretiske forutsigelser.
En rekke strategier erblitt foreslått for å møte denne utfordring. 8-24 Disse inkluderer, for eksempel, enkel (low-cost) termisk gløding av metallfilmer 8,9 eller dispersjon av pre-syntetisert metall nanopartikler, 10,11 begge resulterte i vellykkede demonstrasjoner av plasmonic lys fangst. Det bør imidlertid påpekes at metallnanostrukturer fabrikkert av disse fremgangsmåtene er vanligvis vanskelig å samsvare med de teoretiske modellene. I motsetning til tradisjonelle Nanofabrication teknikker i halvlederindustrien, som for eksempel fotolitografi og elektronstråle-litografi, kan styre 12,13 strukturer godt under sub-100 nm-nivå, men de er ofte for kostbare og tidkrevende å gjelde for solceller, hvor stort område evne med lav kostnad er viktig. For å oppfylle den lave kostnader, høy gjennomstrømming, og krav med nanoskala kontrollerbarhet store-området, metoder som nanoimprint litografi, 14-16 myk litografi, 17,18 </sup> Nanosfære litografi, 19-21 og hole-maske kolloidalt litografi 22-24 ville være lovende. Blant disse valgene, har vi utviklet en myk litografisk, avansert overføring utskrift teknikk. 25 Bruke en nanostrukturerte poly (dimetylsiloksan) (PDMS) frimerker og blokkopolymer-baserte klebesjiktene, kan fordelingen av bestilte metall nanostrukturer lett oppnås på en rekke teknologisk relevante materialer, inkludert de for solceller.
Fokus for denne artikkelen er å beskrive detaljert prosedyre for vår overføring utskrift tilnærming til å innlemme effektive lys fangst Plasmonic nanostrukturer i eksisterende solcelle strukturer. Som en demonstrative tilfellet Ag nanodisks og tynnfilm hydrogenert mikrokrystallinsk Si (mikrochipen-Si: H) solceller ble valgt i denne undersøkelsen (figur 1), 26 selv om andre typer av metaller og solceller er kompatible med denne tilnærmingen. Sammen med sin prosessenkelhet, ville tilnærmingen være av interesse for ulike forskere som et nyttig verktøy for å integrere funksjonelle metall nanostrukturer med enheter.
Protocol
Representative Results
Discussion
I denne artikkelen, ble en tolags harde / myke PDMS sammensatte brukt som stempel materialer. 27 Denne kombinasjonen ble funnet å være avgjørende for å nøyaktig gjenskape den overordnede nanostrukturen i formen, som var en hexagonally tettpakket runde hull matrise hvis diameter på 230 nm, dybde på 500 nm, og hole senter-til-senter avstand på 460 nm. Når bare myke PDMS ble anvendt, stempelet alltid resultert i en dårlig nanostrukturerte overflate (for eksempel ingen skarp kant i den inverterte søyle…
Disclosures
The authors have nothing to disclose.
Acknowledgements
The authors thank New Energy and Industrial Technology Development Organization (NEDO) under Ministry of Economy, Trade, and Industry (METI), Japan, for the financial support.
Materials
| Nanohole mold | Scivax http://www.scivax.com |
FLH230/500-120 | |
| PTFE container | Eishin http://www.colbyeishin.com |
n/a | Custom made |
| Hard-PDMS materials | Gelest http://www.gelest.com/gelest/forms/Home/home.aspx |
VDT-731 | Vinylmethylsiloxane-dimethylsiloxane copolymer |
| SIP6831.1 | Pt-divinyltetramethyldisiloxane complex | ||
| HMS-301 | Methylhydrosiloxane-dimethylsiloxane copolymer | ||
| 2,4,6,8-tetramethyltetra-vinylcyclotetrasiloxane | Sigma-Aldrich http://www.sigmaaldrich.com |
396281 | Additive for hard-PDMS |
| Soft-PDMS materials | Dow Corning http://www.dowcorning.com |
Sylgard-184 | Silicone precursor |
| PS-b-P2VP | Polymer Source http://polymersource.com |
P5742-S2VP | Mn × 103 = 133-b-132 |
| Glass/SnO2:F substrates | Asahi Glass Co. Ltd. http://www.agc.com/english/company |
Type VU | Chemical mechanical polished by D-process Inc. (http://d-process.jp/index.html) to flatten the surfaces |
| Detergent | Fruuchi Chemical Co. http://www.furuchi.co.jp/eng/main.htm |
Semico-clean 56 | Used for the cleaning of Glass/SnO2:F substrates |
| ZnO:Ga supputtering target | AGC Ceramics Co. Ltd. http://www.agcc.jp/2005/en/index.html |
5.7GZO | |
| Ag supputtering target | Mitsubishi Materials Co. http://www.mitsubishicarbide.com/mmc/en/index.html |
4NAg | |
| Double-sided adhesive tape | Nisshin EM Co. http://nisshin-em.co.jp/information/carbontape.html |
732 | |
| Polyimide tape | Dupont http://www.dupont.com/products-and-services/membranes-films/polyimide-films/brands/kapton-polyimide-film.html |
Kapton 650S#25 | |
| Sn-Zn-based Solder | Kuroda Techno Co., Ltd. http://www.kuroda-techno.com/english/index.html |
Cerasolzer AL-200 | |
| Digital micro pipette | Nichiryo http://www.nichiryo.co.jp/en/product/pipette/ex/index.html |
00-NPX2-20 00-NPX2-200 00-NPX2-1000 |
|
| Heating chamber | Tokyo Rikakikai Co., Ltd. http://www.eyelaworld.com/product_view.php?id=120 |
VOS-201SD | |
| Electron beam evaporator (two types) |
Canon-Anelva https://www.canon-anelva.co.jp/english/index.html |
n/a | Custom made |
| Arios http://arios.com/ |
n/a | Custom made | |
| Sputtering system | Ulvac http://www.ulvac.co.jp/en |
SBR-2306 | |
| PECVD system | Shimadzu Emit Co. Ltd. http://www.shimadzu.co.jp/emit/en/ |
SLCM-13 | |
| Ar plasma system | Diner Electric Gmbh http://www.plasma.de/index.html |
Femto | |
| RIE system | Samco Inc. http://www.samcointl.com |
RIE-10NR | |
| Ultrasonic soldering device | Colby-Eishin Enterprises, Inc. http://www.colbyeishin.com/sub_sunbonder.htm |
SUNBONDER | |
| EQE measurement system | Bunkoukeiki Co. Ltd. http://www.bunkoukeiki.co.jp/ |
CEP-25BXS | |
| J-V characteristics measurement system | OTENTOSUN-5S-I/V | ||
| Amorphous Si reference cell | WPVS-NPB-S1 | For light intensity calibration | |
| Digital multi-meter | Keithley Instruments Inc. http://www.keithley.com/ |
2400 |
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