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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

DOI:
10.3791/54030-v

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06:58 min

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July 12, 2016

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, , ,
1Department of Physics,Central Michigan University

Chapters

  • 00:05Title
  • 00:45Material Preparations
  • 01:45Apparatus Preparations, Etching and Collecting
  • 03:29Field Emission Point Testing
  • 05:27Results: Etching through FEP Testing
  • 06:32Conclusion

Summary

자동 번역

자동 번역

A method for electrochemically etching field emission tips is presented. Etching parameters are characterized and the operation of the tips in field emission mode is investigated.

Tags

Electrochemical EtchingField Emission Points (FEPs)Tungsten RodsElectron Impact IonizationMass SpectrometrySodium Hydroxide SolutionDC Power SupplyCopper CathodeFEP Catcher Block

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