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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

DOI:
10.3791/54551-v

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07:47 min

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February 12, 2017

•

,
1Department of Chemistry,Portland State University, 2Logic Technology Department,Intel Corporation

Chapters

  • 00:05Title
  • 01:20Derivatization and Characterization of Silicon Wafer Surfaces
  • 02:14Gold Nanoparticle (GNP) Deposition into E-beam-patterned Holes
  • 03:46Pol(methyl methacrylate) (PMMA) Photoresist Reflow and Dry- and Wet-etching
  • 04:50Results: Reduction of Shot-noise by Deposition and Subsequent Etching of Sacrificial GNPs
  • 06:29Conclusion

Summary

자동 번역

자동 번역

Uniformly sized nanoparticles can remove fluctuations in contact hole dimensions patterned in poly(methyl methacrylate) (PMMA) photoresist films by electron beam (E-beam) lithography. The process involves electrostatic funneling to center and deposit nanoparticles in contact holes, followed by photoresist reflow and plasma- and wet-etching steps.

Tags

Keywords: Sacrificial NanoparticlesShot-noiseE-beam LithographyContact HolesSub-20 Nanometer PatternsRCA CleaningAATMSPMMAGold NanoparticlesEvaporation

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