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1Department of Mechanical Engineering,University of Hong Kong, 2Department of Mechanical Engineering,University of Michigan, 3Department of Electrical Engineering and Computer Science,University of Michigan, 4Department of Chemistry,University of Hong Kong, 5HKU-Shenzhen Institute of Research and Innovation
Chapters
- 00:05Title
- 01:27Photolithography-based Fabrication of an Embedded Metal-mesh Transparent Electrode (EMTE)
- 05:14Electron-beam Lithography-based Fabrication of a Sub-micron EMTE
- 07:44EMTE Characterization
- 08:33Results: EMTE Fabrication by the Lithography, Electroplating, and Imprint Transfer (LEIT) Method
- 10:05Conclusion
This protocol describes a solution-based fabrication strategy for high-performance, flexible, transparent electrodes with fully-embedded, thick metal mesh. Flexible transparent electrodes fabricated by this process demonstrate among the highest reported performances, including ultra-low sheet resistance, high optical transmittance, mechanical stability under bending, strong substrate adhesion, surface smoothness, and environmental stability.
