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通过生长和退火过程中的氧空位控制来调整氧化物性能

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Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing

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通过生长和退火过程中的氧空位控制来调整氧化物性能

DOI:

10.3791/58737-v

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06:44 min

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June 09, 2023

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Tristan Steegemans*¹, Shinhee Yun*¹, Carlos N. Lobato, Eric Brand, Yunzhong Chen, Felix Trier, Dennis V. Christensen

¹Department of Energy Conversion and Storage,Technical University of Denmark, ²Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences

Chapters

00:05Introduction
00:48Controlling Properties by Varying Growth Conditions
03:26Controlling Properties by Thermal Annealing
04:23Results: Electronic Properties of SrTiO₃-Based Heterostructures Tuned by Growth Modifications and Annealing
06:13Conclusion

Summary

자동 번역

氧化物材料显示出许多奇特的特性，可以通过调节氧含量来控制。在这里，我们演示了通过改变脉冲激光沉积参数和执行后退火来调整氧化物中的氧含量。例如，SrTiO₃基异质结构的电子性能通过生长修饰和退火来调节。

Tags

Oxygen Vacancy Oxide Thin Films Defect Engineering Strontium Titanate Substrate Cleaning Surface Termination Thin Film Deposition Gamma Alumina

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