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3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry
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3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

DOI:
10.3791/61065-v

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07:10 min

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April 29, 2020

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, , , ,
1Łukasiewicz Research Network-Institute of Electronic Materials Technology

Chapters

  • 00:00Introduction
  • 00:57Defect Selective Etching
  • 02:09Scanning Electron Microscopy
  • 02:50Secondary Ion Mass Spectrometry
  • 05:34Results: Oxygen Counts in a Cuboid
  • 06:29Conclusion

Summary

자동 번역

자동 번역

The presented method describes how to identify and solve measurement artifacts related to secondary ion mass spectrometry as well as obtain realistic 3D distributions of impurities/dopants in solid state materials.

Tags

Keywords: 3D Depth ProfileSegregated ImpuritiesSecondary Ion Mass SpectrometrySemiconductor TechnologyStructural DefectsEutectic MixtureDefect-selective EtchingGallium NitrideScanning Electron MicroscopySIMS Calibration

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