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牺牲纳米颗粒使用删除散粒噪声的影响通过电子束光刻装配式接触孔

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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

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牺牲纳米颗粒使用删除散粒噪声的影响通过电子束光刻装配式接触孔

DOI:

10.3791/54551-v

•

07:47 min

•

February 12, 2017

•

Shankar B. Rananavare, Moshood K. Morakinyo

¹Department of Chemistry,Portland State University, ²Logic Technology Department,Intel Corporation

Capítulos

00:05Título
01:20Derivatization and Characterization of Silicon Wafer Surfaces
02:14Gold Nanoparticle (GNP) Deposition into E-beam-patterned Holes
03:46Pol(methyl methacrylate) (PMMA) Photoresist Reflow and Dry- and Wet-etching
04:50Results: Reduction of Shot-noise by Deposition and Subsequent Etching of Sacrificial GNPs
06:29Conclusion

Summary

Tadução automática

均匀尺寸的纳米颗粒可以除去在有机玻璃图案化的接触孔尺寸（PMMA）光致抗蚀剂膜通过电子束（E-束）光刻波动。该方法包括静电漏斗中的接触孔中心并沉积的纳米颗粒，随后光致抗蚀剂回流和等离子体和湿法蚀刻步骤。

Tags

Sacrificial Nanoparticles Shot-noise E-beam Lithography Contact Holes Sub-20 Nanometer Patterns RCA Cleaning AATMS PMMA Gold Nanoparticles Evaporation

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