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二氧化钒原子层沉积与温度依赖性光学模型

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JoVE Journal Engenharia

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model

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二氧化钒原子层沉积与温度依赖性光学模型

DOI:

10.3791/57103-v

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11:10 min

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May 23, 2018

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Marc Currie, Michael A. Mastro, Virginia D. Wheeler

¹Naval Research Laboratory

Capítulos

00:04Título
00:56Atomic Layer Deposition (ALD) of Amorphous Vanadium Dioxide (VO₂) on Sapphire Substrates
03:06Annealing Amorphous VO₂ Thin Films
04:45Characterization of VO₂ Films by Raman Spectroscopy
05:43Characterization of VO₂Films by X-Ray Photoelectron Spectroscopy (XPS)
07:31Morphological Characterization by Atomic Force Microscopy (AFM)
09:06Results: Characterization of Amorphousand Crystalline VO₂ Films
10:49Conclusion

Summary

Tadução automática

利用蓝宝石基底上的原子层沉积 (Å) 制备了二氧化钒薄膜 (100-1000) (₂)。在此之后, 光学性能的特点是通过₂的 VO 的金属绝缘子转换。通过测量的光学特性, 建立了一个模型来描述₂的可调谐折射率。

Tags

Keywords: Atomic Layer Deposition Vanadium Dioxide Temperature-dependent Optical Model Phase Change Materials Thin Film Deposition Sapphire Substrate Ozone TEMAV Metal-insulator Transition Refractive Index Annealing Ultra-high Vacuum

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