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Fokuserad jonstråle litografi till etch nano-arkitekturer i mikroelektroder
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1Department of Electrical Engineering and Computer Science,University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine,University of Michigan, 4Department of Biomedical Engineering,University of Michigan, 5Michigan Center for Materials Characterization,University of Michigan, 6Carl Zeiss SMT, Inc.
Capítulos
- 00:04Título
- 00:51Aligning the Focus Ion Beam (FIB) to the Silicon Probes
- 09:46Writing an Automated Process for Etching
- 11:28Results: FIB Etched Nano-architecture on the Surfaces of Intracortical Probes and Microelectrodes Affects Neuron Density and Electrophysiology
- 13:08Conclusion
Vi har visat att etsning av Nano-arkitektur i intracortical mikroelektrod enheter kan minska den inflammatoriska reaktionen och har potential att förbättra elektrofysiologiska inspelningar. De metoder som beskrivs häri skissera en strategi för etch nano-arkitekturer i ytan av icke-funktionella och funktionella enda skaft kisel intracortical mikroelektroder.
