/
/
Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices
É necessária uma assinatura da JoVE para visualizar este conteúdo. Faça login ou comece sua avaliação gratuita.
Capítulos
- 00:05Introduction
- 00:54Preparation of PDMS Templates and Gel Film Deposition on SOI Substrates by Dip-Coating
- 02:55Surface Micro/Nanostructuration by Soft Imprint Lithography and Gel Film Crystallization by Thermal Treatment
- 04:00Preparing and Patterning of the Quartz Samples for the Cantilever Microfabrication Process
- 08:49Results: Qualitative Analysis of the Progressive Epitaxial Nanostructured α-Quartz Film Thickness Developed on Silicon
- 10:20Conclusion
This work presents a detailed protocol for the microfabrication of nanostructured α-quartz cantilever on a Silicon-On-Insulator(SOI) technology substrate starting from the epitaxial growth of quartz film with the dip coating method and then nanostructuration of the thin film via nanoimprint lithography.
Tags
EpitaxialNanostructuredAlpha-quartzSiliconQuartz-based SensorsMiniaturizationMonolithic IntegrationChemical IntegrationEpitaxial RequirementsMicrocantileversActive Microelectromechanical SystemLead-free Piezoelectric Oxide MaterialsMass SensitivityPDMSSOI SubstrateDip CoatingGel FilmMicro/nanostructure
