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Journal
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Engineering
/
Parallel Active Cantilever Arrays in AFMS to Enable High-Throughput Inspections
/
Instrument Calibration, Experimental Setup, and Parameter Tuning for Semiconductor Wafer Topography Imaging with AFM
JoVE Journal
Engineering
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JoVE Journal
Engineering
Instrument Calibration, Experimental Setup, and Parameter Tuning for Semiconductor Wafer Topography Imaging with AFM
Instrument Calibration, Experimental Setup, and Parameter Tuning for Semiconductor Wafer Topography Imaging with AFM
Parallel Active Cantilever Arrays in AFMS to Enable High-Throughput Inspections
DOI:
10.3791/200439-v
•
03:41 min
•
June 13, 2023
•
Fangzhou Xia
,
Kamal Youcef-Toumi
,
Thomas Sattel
,
Eberhard Manske
,
Ivo W. Rangelow
5
1
Mechatronics Research Lab, Department of Mechanical Engineering
,
Massachusetts Institute of Technology
,
2
Mechatronics Group, Department of Mechanical Engineering
,
Ilmenau University of Technology
,
3
Production and Precision Measurement Technology Group, Institute of Process Measurement and Sensor Technology
,
Ilmenau University of Technology
,
4
Nanoscale Systems Group, Institute of Process Measurement and Sensor Technology
,
Ilmenau University of Technology
,
5
nano analytik GmbH
Tags
AFM
Topography Imaging
Semiconductor Wafer
Calibration
Experimental Setup
Parameter Tuning
Cantilever Probe Array
Resonance Frequency
Tapping Mode
PID Controller
Spatial Resolution
Stitched Panoramic Image
Extreme UV Lithography Mask
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