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Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices
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JoVE Journal Engineering
Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices

Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices

DOI:
10.3791/56408-v

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09:14 min

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December 07, 2017

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, ,
1Advanced Technology Institute, Electrical and Electronic Engineering,University of Surrey

Chapters

  • 00:05Title
  • 00:56Preparation of Substrates
  • 02:03Photolithography Bilayer Process for Contacts
  • 04:04Deposition of Metal Contacts
  • 04:59Flow-assisted Dielectrophoresis of Nanowires
  • 06:48Results: I-V Characteristics of a Silicon Nanowire Field Effect Transistor Mode Using Flow-aasisted Dielectrophoresis
  • 08:05Conclusion

Summary

Automatic Translation

Automatic Translation

In this paper, flow assisted dielectrophoresis is demonstrated for the self-assembly of nanowire devices. The fabrication of a silicon nanowire field effect transistor is shown as an example.

Tags

Flow-assisted DielectrophoresisSolution-processable Nanowire DevicesSemiconductor NanowiresNanowire AlignmentNanowire SelectionNanomaterial Self-assemblySolution-based Device FabricationSemiconductor DevicesNanofabricationScalable Nanowire Device Manufacturing

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