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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Article DOI: 10.3791/54030-v • 06:58 min • July 12th, 2016
July 12th, 2016 •
1, 1, 1, 1
1Department of Physics, Central Michigan University

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Summary
Automatic Translation

A method for electrochemically etching field emission tips is presented. Etching parameters are characterized and the operation of the tips in field emission mode is investigated.

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Electrochemical Etching Characterization Sharp Field Emission Points Electron Impact Ionization Tungsten Rods Field Emission Mode Electron Beam Mass Spectrometry Reliable Technique Modest Equipment Eranjan Nadeesha Graduate Students Tungsten Rod Preparation Wire Clippers Sonication Acetone Cleaning Deionized Water Rinse Sodium Hydroxide Solution Preparation And Handling
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