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توصيف شامل العيوب الممتدة في المواد أشباه الموصلات من خلال مجهر المسح الإلكتروني
JoVE Revista
Ingeniería
This content is Free Access.
JoVE Revista Ingeniería
Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
DOI:

11:14 min

May 28, 2016

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Capítulos

  • 00:05Título
  • 01:16Sample Preparation for Cryo-cathodoluminescence Experiment
  • 02:06Cryo-cathodoluminescence Experiment
  • 06:28Performing Cross-correlation Electron Backscatter Diffraction Experiments
  • 08:50Results: Cathodoluminenscence and Strain Fields of Extended Defects in Silicon
  • 10:19Conclusion

Summary

Traducción Automática

The optical, electrical, and structural properties of dislocations and of grain boundaries in semiconductor materials can be determined by experiments performed in a scanning electron microscope. Electron microscopy has been used to investigate cathodoluminescence, electron beam induced current, and diffraction of backscattered electrons.

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