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Fokuseret Ionstrålithografi til etch Nano-arkitekturer i Mikroelektroderne
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1Department of Electrical Engineering and Computer Science,University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine,University of Michigan, 4Department of Biomedical Engineering,University of Michigan, 5Michigan Center for Materials Characterization,University of Michigan, 6Carl Zeiss SMT, Inc.
Chapitres
- 00:04Titre
- 00:51Aligning the Focus Ion Beam (FIB) to the Silicon Probes
- 09:46Writing an Automated Process for Etching
- 11:28Results: FIB Etched Nano-architecture on the Surfaces of Intracortical Probes and Microelectrodes Affects Neuron Density and Electrophysiology
- 13:08Conclusion
Vi har vist, at ætsning af Nano-arkitektur i intracortical mikroelektrode enheder kan reducere den inflammatoriske respons og har potentiale til at forbedre elektrofysiologiske optagelser. Metoderne beskrevet heri skitserer en tilgang til etch Nano-arkitekturer i overfladen af ikke-funktionelle og funktionelle enkelt skaft silicium intracortical mikroelektroder.
