Waiting
Elaborazione accesso...

Trial ends in Request Full Access Tell Your Colleague About Jove
Journal / Engineering / Selective Area Modification of Silicon Surface…
JoVE Journal
Engineering

È necessario avere un abbonamento a JoVE per visualizzare questo Contenuto. Accedi o inizia la tua prova gratuita.

JoVE Journal Engineering
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
 

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment

Article DOI: 10.3791/52720-v • 08:48 min • November 9th, 2015
November 9th, 2015 •
1, 1, 1
1Laboratory for Quantum Semiconductors and Photon-based BioNanotechnology, Interdisciplinary Institute for Technological Innovation, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Faculty of Engineering, Université de Sherbrooke

Capitoli

Riepilogo
Automatic Translation

We report on a process of in situ alteration of HF treated Si (001) surface into a hydrophilic or hydrophobic state by irradiating samples in microfluidic chambers filled with H2O2/H2O solution (0.01%-0.5%) or methanol solutions using pulsed UV laser of a relative low pulse fluence.

Tags

Keywords: Silicon Surface Wettability Pulsed UV Laser Irradiation Liquid Environment Superhydrophilic Hydrophobic Surface Functionalization Biosensing OH-terminated Si Si-OCH3 Compounds
Read Article

Get cutting-edge science videos from JoVE sent straight to your inbox every month.

Waiting X
Simple Hit Counter