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Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
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1Department of Electrical Engineering and Computer Science,University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine,University of Michigan, 4Department of Biomedical Engineering,University of Michigan, 5Michigan Center for Materials Characterization,University of Michigan, 6Carl Zeiss SMT, Inc.
Capitoli
- 00:04Titolo
- 00:51Aligning the Focus Ion Beam (FIB) to the Silicon Probes
- 09:46Writing an Automated Process for Etching
- 11:28Results: FIB Etched Nano-architecture on the Surfaces of Intracortical Probes and Microelectrodes Affects Neuron Density and Electrophysiology
- 13:08Conclusion
We have shown that the etching of nano-architecture into intracortical microelectrode devices may reduce the inflammatory response and has the potential to improve electrophysiological recordings. The methods described herein outline an approach to etch nano-architectures into the surface of non-functional and functional single shank silicon intracortical microelectrodes.
