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聚焦 Ion 光束平版印刷到蚀刻纳米架构到微电极
JoVE Journal
Bioingegneria
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JoVE Journal Bioingegneria
Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
DOI:

13:49 min

January 19, 2020

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Capitoli

  • 00:04Titolo
  • 00:51Aligning the Focus Ion Beam (FIB) to the Silicon Probes
  • 09:46Writing an Automated Process for Etching
  • 11:28Results: FIB Etched Nano-architecture on the Surfaces of Intracortical Probes and Microelectrodes Affects Neuron Density and Electrophysiology
  • 13:08Conclusion

Summary

Traduzione automatica

我们已经表明,将纳米结构蚀刻到皮内微电极装置中可以减少炎症反应,并有可能改善电生理记录。本文描述的方法概述了将纳米架构蚀刻到非功能和功能性单柄硅皮内微电极表面的方法。

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