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U2O5 Film voorbereiding via UO2 afzetting door gelijkstroom sputteren en opeenvolgende oxidatie en reductie met atomaire zuurstof en waterstof atoom
JoVE 신문
화학
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JoVE 신문 화학
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
DOI:

12:05 min

February 21, 2019

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Chapters

  • 00:04Title
  • 01:06The Labstation Modular Machine
  • 02:11Introduction of the Sample and Sample Holder into the Labstation
  • 03:10Transfer the Sample Holder to the Preparation Chamber
  • 04:03In situ Cleaning of the Sample Holder and Sample Holder Characterization
  • 05:39Deposition of a UO2 Thin Film
  • 06:50UO2 Sample Characterization
  • 07:38Oxidation of UO2 with Atomic Oxygen and Analysis of the UO3 Obtained
  • 08:52Reduction of UO3 by Atomic Hydrogen and Analysis of the U2O5 Obtained
  • 09:45Results: Identification of Uranium(V) in Thin Films
  • 10:51Conclusion

Summary

자동 번역

Dit protocol stelt de voorbereiding van U2O5 dunne lagen verkregen in situ onder ultra hoog vacuüm. Het proces omvat oxidatie en reductie van UO2 films met atomaire zuurstof en waterstof atoom, respectievelijk.

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