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Fabricação de porta-ajustáveis dispositivos de grafeno para tunelamento estudos de microscopia com Coulomb Impurezas
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1Department of Physics,University of California at Berkeley, 2Department of Chemistry,University of California at Berkeley, 3Department of Chemical and Biomolecular Engineering,University of California at Berkeley, 4National Institute for Materials Science (Japan), 5Materials Sciences Division,Lawrence Berkeley National Laboratory, 6Kavli Energy NanoSciences Institute,University of California at Berkeley and Lawrence Berkeley National Laboratory
Capítulos
- 00:05Título
- 02:28Chemical Vapor Deposition of Graphene on a Cu Foil
- 04:28Poly(methyl methacrylate) Transfer of Graphene onto Hexagonal Boron Nitride / Silicon Dioxide Chip
- 06:29STM Tip Calibration on Au(111) Surface
- 08:30Scanning Graphene
- 09:40Results: STM Topography Reveals Coulomb Impurities on Graphene
- 10:44Conclusion
This paper details the fabrication process of a gate-tunable graphene device, decorated with Coulomb impurities for scanning tunneling microscopy studies. Mapping the spatially dependent electronic structure of graphene in the presence of charged impurities unveils the unique behavior of its relativistic charge carriers in response to a local Coulomb potential.
