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Patterning via Optical Saturable Transitions - Fabrication and Characterization
 

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Article DOI: 10.3791/52449-v • 08:19 min • December 11th, 2014
December 11th, 2014 •
1, 2, 1
1Department of Electrical and Computer Engineering, The University of Utah, 2Department of Chemistry, The University of Wisconsin-Madison

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We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

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Keywords: Optical Saturable Transitions Nanolithography Nanopatterning Photochromic Molecules Two-photon Polymerization Beam Pen Lithography Scanning Electron Beam Lithography Focused Ion Beam Patterning Parallel Near-field Optical Lithography
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