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Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices
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Chapters
- 00:05Introduction
- 00:54Preparation of PDMS Templates and Gel Film Deposition on SOI Substrates by Dip-Coating
- 02:55Surface Micro/Nanostructuration by Soft Imprint Lithography and Gel Film Crystallization by Thermal Treatment
- 04:00Preparing and Patterning of the Quartz Samples for the Cantilever Microfabrication Process
- 08:49Results: Qualitative Analysis of the Progressive Epitaxial Nanostructured α-Quartz Film Thickness Developed on Silicon
- 10:20Conclusion
Ces travaux présentent un protocole détaillé pour la microfabrication du porte-à-faux nanostructuré de α quartz sur un substrat technologique silicon-on-isolateur (SOI) à partir de la croissance épitaxique du film de quartz avec la méthode de revêtement de trempette, puis la nanostructuration du film mince par lithographie nanoimprint.
Tags
Keywords: EpitaxialNanostructuredAlpha-quartzSiliconQuartz-based SensorsMiniaturizationMonolithic IntegrationChemical IntegrationEpitaxial RequirementsMicrocantileversActive Microelectromechanical SystemLead-free Piezoelectric Oxide MaterialsMass SensitivityPDMSSOI SubstrateDip CoatingGel FilmMicro/nanostructure
