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高接触密度的制作，平面接口神经电极用于记录和刺激的应用

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Fabrication of High Contact-Density, Flat-Interface Nerve Electrodes for Recording and Stimulation Applications

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高接触密度的制作，平面接口神经电极用于记录和刺激的应用

DOI:

10.3791/54388-v

•

09:35 min

•

October 04, 2016

•

Yazan M. Dweiri³, Matthew A. Stone, Dustin J. Tyler, Grant A. McCallum, Dominique M. Durand

¹Neural Engineering Center,Case Western Reserve University, ²Advanced Platform Technology Center,U.S. Department of Veterans Affairs, ³Jordan University of Science and Technology

Chapters

00:05Title
01:02Contact Placements
03:35Embedding the Electrode Components
05:36Applying Shielding and Completing the Electrode
07:45Results: 7.5-Month Study of FINE Electrode Functionality
08:58Conclusion

Summary

자동 번역

本文提供了一个高接触密度扁平接口神经电极（FINE）的制造过程的详细描述。该电极用于记录和外周神经中选择性刺激神经活动优化。

Tags

Keywords: Flat-interface Cuff Electrodes Neural Interface Neuroprosthetics CAD Software Laser Cutting Spot Welder Silicon Sheet Vacuum Chamber Isotemp Oven Reference Contacts

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