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Metallgestützte elektrochemische Nanoimprintierung von porösen und festen Siliziumwafern
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JoVE 신문 공학
Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
DOI:

09:18 min

February 08, 2022

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Chapters

  • 00:05Introduction
  • 01:19Mac-imprint Stamp Preparation
  • 02:43Photoresist Ultraviolet (UV) Nanoimprinting
  • 04:05Gold and Silver/Gold Catalyst Thin Film Deposition
  • 05:17Silver/Gold Catalyst Thin Film Dealloying
  • 06:01Mac-imprint Operation
  • 07:33Results: Representative Au Porous Stamp and Si Mac-imprint Imaging
  • 08:31Conclusion

Summary

자동 번역

Ein Protokoll für die metallunterstützte chemische Prägung von 3D-Mikroskala-Merkmalen mit einer Formgenauigkeit von sub-20 nm in feste und poröse Siliziumwafer wird vorgestellt.

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