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JoVE Journal Engineering
Selectieve Area Wijziging van Silicon Surface Bevochtigbaarheid door Pulsed UV Laser bestraling in Liquid Milieu
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Selectieve Area Wijziging van Silicon Surface Bevochtigbaarheid door Pulsed UV Laser bestraling in Liquid Milieu

Article DOI: 10.3791/52720-v • 08:48 min • November 9th, 2015
November 9th, 2015 •
1, 1, 1
1Laboratory for Quantum Semiconductors and Photon-based BioNanotechnology, Interdisciplinary Institute for Technological Innovation, Laboratoire Nanotechnologies Nanosystèmes (LN2)- CNRS UMI-3463, Faculty of Engineering, Université de Sherbrooke

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We rapporteren op een werkwijze in situ verandering van HF behandelde Si (001) oppervlak in een hydrofiel of hydrofoob toestand door bestralen monsters microfluïdische kamers gevuld met H 2 O 2 / H2O-oplossing (0,01% -0,5%) en methanol oplossingen met behulp van UV-gepulste laser van een relatief lage hartslag Fluence.

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Engineering Silicon oppervlakte bevochtigbaarheid interactie laser-oppervlakte selectieve gebied verwerking excimerlaser X-ray foto-elektron spectroscopie contact hoek
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