Waiting
로그인 처리 중...

Trial ends in Request Full Access Tell Your Colleague About Jove
Journal / Bioengineering / Focused Ion Beam Lithography to Etch…
JoVE Journal
Bioengineering

JoVE 비디오를 활용하시려면 도서관을 통한 기관 구독이 필요합니다. 전체 비디오를 보시려면 로그인하거나 무료 트라이얼을 시작하세요.

JoVE Journal Bioengineering
Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
 

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes

Article DOI: 10.3791/60004-v • 13:49 min • January 19th, 2020
January 19th, 2020 •
1, 2,4, 5, 6, 2,3,4
1Department of Electrical Engineering and Computer Science, University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine, University of Michigan, 4Department of Biomedical Engineering, University of Michigan, 5Michigan Center for Materials Characterization, University of Michigan, 6Carl Zeiss SMT, Inc.

챕터

요약
Automatic Translation

We have shown that the etching of nano-architecture into intracortical microelectrode devices may reduce the inflammatory response and has the potential to improve electrophysiological recordings. The methods described herein outline an approach to etch nano-architectures into the surface of non-functional and functional single shank silicon intracortical microelectrodes.

Tags

Keywords: Focused Ion Beam Lithography FIB Nano-architectures Microelectrodes Biocompatibility Silicon Metals Polymers Non-planar Surfaces Post-processing Scanning Electron Microscope SEM Silver Paint Stage Coordinates Nitrile Gloves Navigation Camera Microscope User Interface
Read Article

Get cutting-edge science videos from JoVE sent straight to your inbox every month.

Waiting X
Simple Hit Counter