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Bioengineering

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JoVE Journal Bioengineering
Gerichte ionen straal-lithografie voor etch nano-architecturen in micro elektroden
 
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Gerichte ionen straal-lithografie voor etch nano-architecturen in micro elektroden

Article DOI: 10.3791/60004-v • 13:49 min • January 19th, 2020
January 19th, 2020 •
1, 2,4, 5, 6, 2,3,4
1Department of Electrical Engineering and Computer Science, University of Michigan, 2Veteran Affairs Ann Arbor Healthcare System, 3Department of Neurology, School of Medicine, University of Michigan, 4Department of Biomedical Engineering, University of Michigan, 5Michigan Center for Materials Characterization, University of Michigan, 6Carl Zeiss SMT, Inc.

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We hebben aangetoond dat het etsen van nano-architectuur in intracorticale micro-elektrode-apparaten de ontstekingsreactie kan verminderen en de potentie heeft om elektrofysiologische opnames te verbeteren. De hierin beschreven methoden schetsen een benadering van etch nano-architecturen in het oppervlak van niet-functionele en functionele enkelvoudige schacht silicium intracorticale micro elektroden.

Tags

Biotechniek uitgave 155 gerichte ionen straal lithografie intracorticale micro elektroden nano-architectuur elektrofysiologie neuro ontsteking biocompatibiliteit
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