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Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces
 

Demonstration of Equal-Intensity Beam Generation by Dielectric Metasurfaces

Article DOI: 10.3791/59066-v • 09:33 min • June 7th, 2019
June 7th, 2019 •
1, 1, 1,2,3
1Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), 2Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), 3National Institute of Nanomaterials Technology (NINT)

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A protocol for the fabrication and optical characterization of dielectric metasurfaces is presented. This method can be applied to the fabrication of not only beam splitters, but also of general dielectric metasurfaces, such as lenses, holograms, and optical cloaks.

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Keywords: Metasurface Fabrication Dielectric Metasurface Equal-intensity Beam Generation PECVD PMMA Electron Beam Lithography Silicon Photonics
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