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基于多步法链位移光刻的基因功能表面固定化研究

JoVE Journal
Bioengineering

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JoVE Journal Bioengineering

Functional Surface-immobilization of Genes Using Multistep Strand Displacement Lithography

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基于多步法链位移光刻的基因功能表面固定化研究

DOI:

10.3791/58634-v

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11:05 min

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October 25, 2018

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Günther Pardatscher*¹, Matthaeus Schwarz-Schilling*¹, Sandra Sagredo, Friedrich C. Simmel

¹Physics Department,Technical University of Munich

Chapters

00:04Title
00:57Chip Fabrication
02:43Substrate Preparation for Photolithography
04:11Projection Lithography
05:40Holder Assembly for Compartmentalized Gene Expression
07:17Setup for Gene Expression Analysis
09:23Results: Bephore Lithography and Compartmentalized Gene Expression
10:29Conclusion

Summary

Automatic Translation

我们描述了一种简单的光刻程序, 用于固定在表面上的基因长度 DNA 分子, 可用于在生物芯片上执行无细胞基因表达实验。

Tags

Keywords: DNA Biochips Self Re-synthetic Biology Bephore Lithography DNA Strand Displacement Multistep Lithography PEGylation Biotin-PEG-Silane Silicon Wafer Cleaning Substrate Preparation Gene Immobilization Functional Gene Brushes Protein Expression

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