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Chapters
- 00:04Title
- 00:52Deposition of Hydrogenated Amorphous Silicon (a-Si:H) on a Fused Silica Substrate by Plasma-enhanced Chemical Vapor Deposition (PECVD)
- 01:35Formation of the Chromium Etching Mask
- 06:53Etching Process of Hydrogenated Amorphous Silicon
- 07:41Results: The Fabricated Metasurface and its Polarization-independent
- 08:31Conclusion
