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Fabrication of Spatially Confined Complex Oxides
 

Fabrication of Spatially Confined Complex Oxides

Article DOI: 10.3791/50573-v • 08:45 min • July 1st, 2013
July 1st, 2013 •
1,2, 1
1Materials Science and Technology Division, Oak Ridge National Laboratory, 2Department of Physics & Astronomy, University of Tennessee, Knoxville

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résumé
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We describe the use of pulsed laser deposition (PLD), photolithography and wire-bonding techniques to create micrometer scale complex oxides devices. The PLD is utilized to grow epitaxial thin films. Photolithography and wire-bonding techniques are introduced to create practical devices for measurement purposes.

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Fabrication Spatially Confined Complex Oxides High Tc Superconductors Multiferroics Colossal Magnetoresistors Electron Correlations Electronic Phase Separation Resistive Behavior Magnetic Behavior Crystal Alloy Material Length Scales Electronic Domains Novel Behaviors Spin-charge-lattice-orbital Order Parameters Transport Measurements Fundamental Physics Complex Behaviors Electronic Devices Low Dimensional Nano- Or Micro-structures Thin Film Growth Electronic Property Characterization Fabrication Protocols
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